Optical Modeling
The StockerYale team possesses unique expertise in the computer simulation of optical systems, with some of our senior researchers having hands-on experience in the development of optics simulation software. This expertise enables StockerYale to produce state-of-the-art optical devices, and allows our customers a significant reduction in product-to-market time.
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| The design and optimization of LEDs is performed using ASAPT optical design software. This application enables our engineers to streamline standard processes in order to quickly create prototypes for our customers. |
A number of our engineers are experienced in applying commercially available software tools in the modeling of lenses, complete illumination systems, stray light, and laser beam propagation.
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| Using sophisticated commercial and in-house simulation software, StockerYale researchers are able to model optical systems, an essential element in the design of our high-end illumination products. The image above illustrates a 3-dimensional view of a series of optical lenses and the resulting pattern the laser creates. |
Our diffractive gratings group utilizes a number of software packages (some commercially available, some developed in-house) to simulate grating behavior. These modeling tools allow us to provide gratings which display strict suppression of unwanted orders of diffraction, or a high degree of evenness in intensity among a large number of diffraction orders.
Strong optical modeling capabilities and theoretical skills, combined with manufacturing platforms for lasers, LED arrays, fluorescent illumination, diffractive optics and optical fiber, make StockerYale a powerful, flexible and responsive partner of the prototyping and manufacturing of custom OEM illumination and optics components.
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| The above graph (click here for a larger image) illustrates the results of a simulation of diffraction efficiencies for a phase mask, with diffraction efficiency plotted as a function ofs grating profile depth. The blue line indicates the intensity in the zero diffraction order (which is required to be minimized) and the remaining lines give the intensity of the +1 and -1 diffraction orders. This information precisely reveals the appropriate etch depth for a StockerYale phase mask. |


