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Custom Phase Masks

Binary Phase Masks for Optical Waveguide Gratings

Ideal for automated fabrication of volume gratings and surface relief gratings in optical waveguides and integrated optical circuits
Appropriate for silica-on-silicon and other emerging technologies

StockerYale offers a wide range of custom phase masks for the fabrication of gratings in optical waveguides and integrated optical circuits. These custom masks are ideal for diverse applications that require many different substrate configurations. Our proprietary manufacturing process allows custom designed substrate arrangement, with multiple grating regions in one substrate as well as specific dimensions and grating period for each region.

Let StockerYale's experts work with you to determine the optimal phase mask design for your particular application.

Technical Specifications

Substrate material:		Fused silica

Substrate thickness:		3.175 mm, 10.0 mm (other dimensions available upon request)

Period of any single active grating area:		300 nm to 1200 nm

Standard substrate dimensions:		3" x 3", 4" x 4", 5" x 5"

Examples of Custom Configurations

Please note that these drawings are for illustrative purposes only and do not reflect StockerYale's manufacturing limitations. We will be happy to work with you to meet your specific design requirements.

Ordering Information

For more information contact us at or call a sales representative at (603) 870-8286.