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Rectangular Phase Mask

Rectangular substrate allows for easy alignment
Grating lengths from 20.0 mm to 45.0 mm
Holographically recorded

StockerYale’s Rectangular Phase Masks are manufactured in a variety of sizes and can be chirped or have a uniform period. These advanced phase masks are holographically recorded, eliminating “stitching errors” that are a cause of side lobes.

Typical FBG applications:

Dense wavelength division multiplexing (DWDM) filters, and add/drop modules
Frequency lockers and pump stabilizers
Chirped phase masks used to manufacture gain-flattening filters for erbium-doped fiber amplifiers

Technical Specifications

Operating wavelength:	190 - 400 nm

Phase mask period:	0.5 - 1.2 µm

Period manufacturing tolerance	± 0.3 nm for unchirped masks (± 0.1 nm optional)

Period measurement accuracy:	± 0.02 nm

Dimensions	Substrate size / Aperture 17.2 x 24.5 mm / 10 x 20 mm 17.2 x 38.1 mm / 10 x 34 mm 17.2 x 50.8 mm / 10 x 45 mm Custom sizes optional

Chirp range (for chirped masks):	0.03 nm/cm - 40 nm/cm

Damage threshold	Better than 1 J/cm2 per pulse @ 50 Hz @ 248 nm

Diffraction Efficiency	≤3% in 0th order ≥33% in ±1st order ≤1.0% in 0th order ≥35% in ±1st order (optional) for periods between 0.66 and 1.2mm

Material	Corning 7980, Suprasil

Substrate flatness	λ @ 248 nm, both sides

Scratch & Dig	20 - 10

AR coating	Optional

Wedge	< 30 arcsec

Thickness	3.175 mm ± 0.125 mm

For chirped masks; center period precision ± 0.5 nm with ± 200 μm center positioning error

Ordering Information

RPM (RPMC if chirped) - <wavelength of laser> - <mask period> - <(grating dimension (W x L)) substrate dimension (W x L)>

Example: a 17.2 mm x 25.4 mm dimension phase mask to be used with a KrF excimer laser at 248 nm with a period of 1.0600 µm, is specified as: RPM - 248 - 1.0600 - (10 x 20) 17.2 x 25.4

Example for 8 nm/cm chirped mask:
RPMC - 248 - 1.0600 - (10 x 20) 17.2 x 25.4 - 8 nm/cm